Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX

Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX

In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80°C is presented and analysed. We studied basic island patterns, which present union of two symmetrical parallelograms...

Full description

Bibliographic Details
Main Authors: Smiljanić Milče M., Rađenović Branislav, Lazić Žarko, Radmilović-Rađenović Marija, Rašljić-Rafajilović Milena, Cvetanović-Zobenica Katarina, Milinković Evgenija, Filipović Ana
Format: Article
Language:English
Published: Association of Chemical Engineers of Serbia 2021-01-01
Series:Hemijska Industrija
Subjects:
wet etching
level set method simulation
3d silicon structures
microfludic platform
Online Access:http://www.doiserbia.nb.rs/img/doi/0367-598X/2021/0367-598X2101015S.pdf

Internet

http://www.doiserbia.nb.rs/img/doi/0367-598X/2021/0367-598X2101015S.pdf

Similar Items