A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm

by Junjie Li, Yongliang Li, Na Zhou, Guilei Wang, Qingzhu Zhang, Anyan Du, Yongkui Zhang, Jianfeng Gao, Zhenzhen Kong, Hongxiao Lin, Jinjuan Xiang, Chen Li, Xiaogen Yin, Yangyang Li, Xiaolei Wang, Hong Yang, Xueli Ma, Jianghao Han, Jing Zhang, Tairan Hu, Tao Yang, Junfeng Li, Huaxiang Yin, Huilong Zhu, Wenwu Wang, Henry H. Radamson
Published 2020-02-01

Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-Transistors

by Junjie Li, Yongliang Li, Na Zhou, Wenjuan Xiong, Guilei Wang, Qingzhu Zhang, Anyan Du, Jianfeng Gao, Zhenzhen Kong, Hongxiao Lin, Jinjuan Xiang, Chen Li, Xiaogen Yin, Xiaolei Wang, Hong Yang, Xueli Ma, Jianghao Han, Jing Zhang, Tairan Hu, Zhe Cao, Tao Yang, Junfeng Li, Huaxiang Yin, Huilong Zhu, Jun Luo, Wenwu Wang, Henry H. Radamson
Published 2020-04-01