Atomic Layer Deposition (ALD) of Metal Gates for CMOS

by Chao Zhao, Jinjuan Xiang
Published 2019-06-01

On the Dependence of Band Alignment of SiO₂/Si Stack on SiO₂ Thickness: Extrinsic Or Intrinsic?

by Yonggui Xu, Kai Han, Jinjuan Xiang, Xiaolei Wang
Published 2020-01-01

Influence of Applied Stress on the Ferroelectricity of Thin Zr-Doped HfO₂ Films

by Yuwei Cai, Qingzhu Zhang, Zhaohao Zhang, Gaobo Xu, Zhenhua Wu, Jie Gu, Junjie Li, Jinjuan Xiang, Huaxiang Yin
Published 2021-05-01

The Challenges of Advanced CMOS Process from 2D to 3D

by Henry H. Radamson, Yanbo Zhang, Xiaobin He, Hushan Cui, Junjie Li, Jinjuan Xiang, Jinbiao Liu, Shihai Gu, Guilei Wang
Published 2017-10-01

The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O₂/He Plasmas for Thermopile Devices

by Na Zhou, Junjie Li, Haiyang Mao, Hao Liu, Jinbiao Liu, Jianfeng Gao, Jinjuan Xiang, Yanpeng Hu, Meng Shi, Jiaxin Ju, Yuxiao Lei, Tao Yang, Junfeng Li, Wenwu Wang
Published 2020-09-01

Miniaturization of CMOS

by Henry H. Radamson, Xiaobin He, Qingzhu Zhang, Jinbiao Liu, Hushan Cui, Jinjuan Xiang, Zhenzhen Kong, Wenjuan Xiong, Junjie Li, Jianfeng Gao, Hong Yang, Shihai Gu, Xuewei Zhao, Yong Du, Jiahan Yu, Guilei Wang
Published 2019-04-01

Optimization of Structure and Electrical Characteristics for Four-Layer Vertically-Stacked Horizontal Gate-All-Around Si Nanosheets Devices

by Qingzhu Zhang, Jie Gu, Renren Xu, Lei Cao, Junjie Li, Zhenhua Wu, Guilei Wang, Jiaxin Yao, Zhaohao Zhang, Jinjuan Xiang, Xiaobin He, Zhenzhen Kong, Hong Yang, Jiajia Tian, Gaobo Xu, Shujuan Mao, Henry H. Radamson, Huaxiang Yin, Jun Luo
Published 2021-03-01

State of the Art and Future Perspectives in Advanced CMOS Technology

by Henry H. Radamson, Huilong Zhu, Zhenhua Wu, Xiaobin He, Hongxiao Lin, Jinbiao Liu, Jinjuan Xiang, Zhenzhen Kong, Wenjuan Xiong, Junjie Li, Hushan Cui, Jianfeng Gao, Hong Yang, Yong Du, Buqing Xu, Ben Li, Xuewei Zhao, Jiahan Yu, Yan Dong, Guilei Wang
Published 2020-08-01

A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm

by Junjie Li, Yongliang Li, Na Zhou, Guilei Wang, Qingzhu Zhang, Anyan Du, Yongkui Zhang, Jianfeng Gao, Zhenzhen Kong, Hongxiao Lin, Jinjuan Xiang, Chen Li, Xiaogen Yin, Yangyang Li, Xiaolei Wang, Hong Yang, Xueli Ma, Jianghao Han, Jing Zhang, Tairan Hu, Tao Yang, Junfeng Li, Huaxiang Yin, Huilong Zhu, Wenwu Wang, Henry H. Radamson
Published 2020-02-01

Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-Transistors

by Junjie Li, Yongliang Li, Na Zhou, Wenjuan Xiong, Guilei Wang, Qingzhu Zhang, Anyan Du, Jianfeng Gao, Zhenzhen Kong, Hongxiao Lin, Jinjuan Xiang, Chen Li, Xiaogen Yin, Xiaolei Wang, Hong Yang, Xueli Ma, Jianghao Han, Jing Zhang, Tairan Hu, Zhe Cao, Tao Yang, Junfeng Li, Huaxiang Yin, Huilong Zhu, Jun Luo, Wenwu Wang, Henry H. Radamson
Published 2020-04-01