Rapid photolithographic fabrication of high density optical interconnects using refractive index contrast polymers

Rapid photolithographic fabrication of high density optical interconnects using refractive index contrast polymers

We have developed new polymer optical interconnect materials that we termrefractive index contrast (RIC) polymers that are ideally suited to a wide variety of photonic interconnect applications as the refractive index can be tuned over the range of n = 1.42 to 1.56, while index contrast Δn can be pr...

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Bibliographic Details
Main Authors: Brusberg, L. (Author), FRISH, J.I (Author), Himmelhuber, R. (Author), Jiang, L. (Author), Kim, K.-J (Author), KLEINE, T.S (Author), KOCH, T.L (Author), MARTIN, K.P (Author), Nishant, A. (Author), NORWOOD, R.A (Author), Pau, S. (Author), Pyun, J. (Author), Showghi, S. (Author)
Format: Article
Language:English
Published: Optica Publishing Group (formerly OSA) 2022
Subjects:
Dry etching process
Dry films
Index contrasts
Integrated circuit interconnects
Interconnect applications
Interconnect materials
Ion exchange
Optical fiber fabrication
Optical fibers
Optical interconnect
Photonic devices
Photonic interconnects
Polymer optical interconnect
Reactive ion etching
Refractive index
Silicon photonics
Ultraviolet exposure
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