| Summary: | 碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 103 === In this study, tetramethysilane(TMS), a mixed gas of ammonia and oxygen as source gases, etc., the use of plasma enhanced chemical vapor deposition system (PECVD), in the flexible plastic substrate and the silicon substrate manufacturing process, prepared at low temperature organic / inorganic multilayer structure by modulating film thickness of the organic silicon-based thin-film inorganic SiOxNy film to do a multi-layer stack, reduce the infiltration path of moisture and improve the mechanical flexure characteristics, the situation was observed by measuring calcium permeability of water vapor, and the step coverage characteristics of the thin film of water vapor permeability for influence.Studies have shown that a single layer of inorganic SiOxNy film 100 nm has a good film quality (0.036 μm-g / m2 / day) and mechanical flexural properties (critical breaking point 12.4 mm), when added to the organic silicon-based thin film as a buffer. After the layers are attached to the multilayer structure up to Level 5B, in addition, the three of the best organic / inorganic multilayer stack structure, because organic silicon base layer significantly reduces the penetration of water vapor path, beyond the water volume measuring instrument (MOCON) the measurement limit (5 × 10-3 g / m2 / day), so by calcium measurement method to measure the water vapor permeability was observed at room temperature about its water vapor permeability 3.333 × 10-5 g / m2 / day, in addition, the use of self-rule of the deflection observed a pair of two pairs and three pairs of multi-layer structure, with a single layer of inorganic SiOxNy film 100 nm, 200 nm, 300 nm compared to its Critical rupture curvature also improved significantly, showing a multi-layer film structure deposited has better mechanical deflection characteristics on the flexible plastic substrate, then study the penetration of moisture through the cracks mechanism, the use of three of the best organic / inorganic multilayer stack structure with an inorganic SiOxNy film 1 μm radius of curvature of the deflection to 2.5 mm, the measurement method by observing calcium showed its multi-layer structure can effectively reduce the water vapor permeability path, so that the water can’t easily by air Crack calcium metal oxide directly, but only by a part of the region is oxidized, organic silicon base layer shows reduced water vapor permeation path for contribution.Finally, the study of inorganic SiOxNy film deposited in patterned photoresist structure and the silicon substrate silicone particles, with a SEM to explore the step coverage, the study showed, is deposited on the light When the resistance of the patterned structure and the silicone particles, the film thickness of the sidewall deposition thickness is less than expected, the impact of the barrier effect of the gas barrier layer, the sidewall coverage was 64% and 50.6%, showing the sidewall coverage is lowered, the It will affect the barrier effect of inorganic nitrogen silicon oxide film.
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