直接奈米壓印金薄膜光柵成型性分析

碩士 === 國立中正大學 === 機械工程學系暨研究所 === 103 === The nanoimprint lithography for fabricating metallic nano-features on silicon or polymer substrate requires a series of complicated processes including repeated deposition, etching and lift-off. We developed an novel integrated direct nanoimprint process for...

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Bibliographic Details
Main Authors: Yu-Hsun Lee, 李昱勳
Other Authors: Jong-Ning Aoh
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/39169311945720137430