A Study on the Phase Equilibria and Diffusion Behaviors in the Ni-Si-Ge system at 750℃
碩士 === 國立中央大學 === 化學工程研究所 === 87 === In this thesis, the Si-Ge-Ni ternary isotherm at 750 oC was determined by using metallography, electron microanalysis, and x-ray diffraction. The main objective is to provide the necessary thermodynamic information for designing contact materials for t...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49995779784769376147 |