In-situ XPS Investigation of ALD Cu2O and Cu Thin Films after Successive Reduction
This talk was presented in the 14th International Conference on Atomic Layer Deposition (ALD 2014) in Kyoto, Japan on 18th June 2014. Abstract Atomic Layer Deposition (ALD) is emerging as a ubiquitous method for the deposition of conformal and homogeneous ultra-thin films on complex topographies and...
| Main Authors: | , , , , , , |
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| Format: | Others |
| Language: | English |
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Universitätsbibliothek Chemnitz
2014
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| Online Access: | http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043 http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043 http://www.qucosa.de/fileadmin/data/qucosa/documents/14704/Dileep_Dhakal_In-situ_XPS_investgation_of_ALD.pdf http://www.qucosa.de/fileadmin/data/qucosa/documents/14704/signatur.txt.asc |