In-situ XPS Investigation of ALD Cu2O and Cu Thin Films after Successive Reduction

In-situ XPS Investigation of ALD Cu2O and Cu Thin Films after Successive Reduction

This talk was presented in the 14th International Conference on Atomic Layer Deposition (ALD 2014) in Kyoto, Japan on 18th June 2014. Abstract Atomic Layer Deposition (ALD) is emerging as a ubiquitous method for the deposition of conformal and homogeneous ultra-thin films on complex topographies and...

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Bibliographic Details
Main Authors: Dhakal, Dileep, Waechtler, Thomas, E. Schulz, Stefan, Mothes, Robert, Moeckel, Stefan, Lang, Heinrich, Gessner, Thomas
Other Authors: TU Chemnitz, Center for Microtechnologies
Format: Others
Language:English
Published: Universitätsbibliothek Chemnitz 2014
Subjects:
Atomic Layer Deposition (ALD)
Cuprous Oxide (Cu2O)
X-ray Photoelectron Spectroscopy (XPS)
Surface Chemistry
ddc:540
ddc:620
Röntgen-Photoelektronenspektroskopie
Oberflächenchemie
Online Access:http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043
http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043
http://www.qucosa.de/fileadmin/data/qucosa/documents/14704/Dileep_Dhakal_In-situ_XPS_investgation_of_ALD.pdf
http://www.qucosa.de/fileadmin/data/qucosa/documents/14704/signatur.txt.asc

Internet

http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043
http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043
http://www.qucosa.de/fileadmin/data/qucosa/documents/14704/Dileep_Dhakal_In-situ_XPS_investgation_of_ALD.pdf
http://www.qucosa.de/fileadmin/data/qucosa/documents/14704/signatur.txt.asc

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