Singularities of Polishing Substrates GaAs by Chemo-Dynamical and Non-Contact Chemo-Mechanical Methods
<p class="ArticleAnnotation"><span lang="EN-US">The comparative investigation of two chemical polishing methods as applied to GaAs substrates is carried out. In both cases the equal etchant Br<sub>2</sub>+HBr was used. The comparison of etching rates and o...
Main Authors: | G. A. Pashchenko, M. J. Kravetsky, O. V. Fomin |
---|---|
Format: | Article |
Language: | English |
Published: |
Vasyl Stefanyk Precarpathian National University
2016-10-01
|
Series: | Фізика і хімія твердого тіла |
Online Access: | http://journals.pu.if.ua/index.php/pcss/article/view/797 |
Similar Items
-
Wear model for chemo-mechanical polishing of single crystal silicon
by: Mess, Francis McCarthy
Published: (2007) -
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
by: A.V. Fomin, et al.
Published: (2017-04-01) -
Synchronization of chemo-mechanical oscillators
by: Masahiro Kasai, et al.
Published: (2020-06-01) -
Bio-chemo-mechanics of the thoracic aorta
by: Sashini Iddawela, et al.
Published: (2021-02-01) -
Chemo-therapeutic studies
by: Stocken, Lloyd Arthur
Published: (1943)