Singularities of Polishing Substrates GaAs by Chemo-Dynamical and Non-Contact Chemo-Mechanical Methods

<p class="ArticleAnnotation"><span lang="EN-US">The comparative investigation of two chemical polishing methods as applied to GaAs substrates is carried out. In both cases the equal etchant Br<sub>2</sub>+HBr was used. The comparison of etching rates and o...

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Bibliographic Details
Main Authors: G. A. Pashchenko, M. J. Kravetsky, O. V. Fomin
Format: Article
Language:English
Published: Vasyl Stefanyk Precarpathian National University 2016-10-01
Series:Фізика і хімія твердого тіла
Online Access:http://journals.pu.if.ua/index.php/pcss/article/view/797