Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C

Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C

This paper presents etching of convex corners with sides along <n10> and <100> crystallographic directions in a 25 wt% tetramethylammonium hydroxide (TMAH) water solution at 80 °C. We analyzed parallelograms as the mask patterns for anisotropic wet etching of Si...

Full description

Bibliographic Details
Main Authors: Milče M. Smiljanić, Žarko Lazić, Vesna Jović, Branislav Radjenović, Marija Radmilović-Radjenović
Format: Article
Language:English
Published: MDPI AG 2020-02-01
Series:Micromachines
Subjects:
no convex corner compensation
parallelogram
silicon
wet etching
tetramethylammonium hydroxide (tmah)
Online Access:https://www.mdpi.com/2072-666X/11/3/253

Internet

https://www.mdpi.com/2072-666X/11/3/253

Similar Items