Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

We investigated the removal of polymers with various chemical structures and the removal of ion-implanted resists using wet ozone. The removal rates of polymers that have carbon-carbon (C–C) double bonds in the main chain were high. The main chain of these polymers may be decomposed. The removal rat...

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Bibliographic Details
Main Authors: Hideo Horibe, Yousuke Goto
Format: Article
Language:English
Published: Hindawi Limited 2012-01-01
Series:International Journal of Polymer Science
Online Access:http://dx.doi.org/10.1155/2012/937928