Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

by Hideo Horibe, Yousuke Goto
Published 2012-01-01

Concept model of atomic hydrogen dry developing process for photolithographic patterning

by Yuki Takemori, Masao Gohdo, Yuta Koda, Hideo Horibe
Published 2020-10-01

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

by Masashi Yamamoto, Shiro Nagaoka, Hironobu Umemoto, Keisuke Ohdaira, Takashi Nishiyama, Hideo Horibe
Published 2017-01-01