Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H<sub>2</sub>S Gas Mixture

Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H<sub>2</sub>S Gas Mixture

A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H<sub>2</sub>S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigate...

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Bibliographic Details
Main Authors: Z. Hubička, M. Čada, A. Kapran, J. Olejníček, P. Kšírová, M. Zanáška, P. Adámek, M. Tichý
Format: Article
Language:English
Published: MDPI AG 2020-03-01
Series:Coatings
Subjects:
hipims
langmuir probe
optical emission spectrometry
time-resolved probe measurements
h<sub>2</sub>s, electron density
electron temperature
ionization fraction
sem, xrd
Online Access:https://www.mdpi.com/2079-6412/10/3/246

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https://www.mdpi.com/2079-6412/10/3/246

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