Effect of Oxygen Source on the Various Properties of SnO<sub>2</sub> Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Effect of Oxygen Source on the Various Properties of SnO<sub>2</sub> Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Herein, we performed a comparative study of plasma-enhanced atomic layer deposition (PEALD) of SnO<sub>2</sub> films using Sn(dmamp)<sub>2</sub> as the Sn source and either H<sub>2</sub>O plasma or O<sub>2</sub> plasma as the oxygen source in a wide te...

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Bibliographic Details
Main Authors:	Jong Hyeon Won, Seong Ho Han, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han
Format:	Article
Language:	English
Published:	MDPI AG 2020-07-01
Series:	Coatings
Subjects:	SnO<sub>2</sub> film plasma-enhanced atomic layer deposition oxygen source H<sub>2</sub>O plasma O<sub>2</sub> plasma Sn(dmamp)<sub>2</sub>
Online Access:	https://www.mdpi.com/2079-6412/10/7/692

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