Effect of Oxygen Source on the Various Properties of SnO<sub>2</sub> Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Effect of Oxygen Source on the Various Properties of SnO<sub>2</sub> Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Herein, we performed a comparative study of plasma-enhanced atomic layer deposition (PEALD) of SnO<sub>2</sub> films using Sn(dmamp)<sub>2</sub> as the Sn source and either H<sub>2</sub>O plasma or O<sub>2</sub> plasma as the oxygen source in a wide te...

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Bibliographic Details
Main Authors: Jong Hyeon Won, Seong Ho Han, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han
Format: Article
Language:English
Published: MDPI AG 2020-07-01
Series:Coatings
Subjects:
SnO<sub>2</sub> film
plasma-enhanced atomic layer deposition
oxygen source
H<sub>2</sub>O plasma
O<sub>2</sub> plasma
Sn(dmamp)<sub>2</sub>
Online Access:https://www.mdpi.com/2079-6412/10/7/692

Internet

https://www.mdpi.com/2079-6412/10/7/692

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