Al2O3 growth rate Al2o3 growth rate Alumina Aluminum Aluminum oxide Annealing Atomic layer deposition Current density Deposition temperatures Effect of HF-dip Growth rate Hafnium oxides Hydrofluoric acid Interface states Long term stability Long-term stability al2o3 Optimal deposition temperature al2o3 Out-of-the-box silicon oxide Passivation Plasma stability Plasma temperature Silicon Silicon oxides Substrates Surface passivation TMA + O3 + H2O ALD TMA + o3 + H2O ALD Temperature measurement Thermal stability Thermodynamic stability