Characteristics of layered tin disulfide deposited by atomic layer deposition with H2S annealing

by Seungjin Lee, Seokyoon Shin, Giyul Ham, Juhyun Lee, Hyeongsu Choi, Hyunwoo Park, Hyeongtag Jeon
Published 2017-04-01

Development of a SnS Film Process for Energy Device Applications

by Hyeongsu Choi, Namgue Lee, Hyunwoo Park, Yeonsik Choi, Keunsik Kim, Yeongtae Choi, Jongwoo Kim, Seokhwi Song, Hyunwoo Yuk, Hyeongtag Jeon
Published 2019-10-01

Improved electrical properties of atomic layer deposited tin disulfide at low temperatures using ZrO2 layer

by Juhyun Lee, Jeongsu Lee, Giyul Ham, Seokyoon Shin, Joohyun Park, Hyeongsu Choi, Seungjin Lee, Juyoung Kim, Onejae Sul, Seungbeck Lee, Hyeongtag Jeon
Published 2017-02-01

Remote Plasma Atomic Layer Deposition of SiN_x Using Cyclosilazane and H₂/N₂ Plasma

by Haewon Cho, Namgue Lee, Hyeongsu Choi, Hyunwoo Park, Chanwon Jung, Seokhwi Song, Hyunwoo Yuk, Youngjoon Kim, Jong-Woo Kim, Keunsik Kim, Youngtae Choi, Suhyeon Park, Yurim Kwon, Hyeongtag Jeon
Published 2019-08-01