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Remote Plasma Atomic Layer Deposition of SiN<sub>x</sub> Using Cyclosilazane and H<sub>2</sub>/N<sub>2</sub> Plasma

by Haewon Cho, Namgue Lee, Hyeongsu Choi, Hyunwoo Park, Chanwon Jung, Seokhwi Song, Hyunwoo Yuk, Youngjoon Kim, Jong-Woo Kim, Keunsik Kim, Youngtae Choi, Suhyeon Park, Yurim Kwon, Hyeongtag Jeon
Published 2019-08-01

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