Electrical properties and interfacial issues of high-k/Si MIS capacitors characterized by the thickness of Al2O3 interlayer

by Xing Wang, Hongxia Liu, Chenxi Fei, Lu Zhao, Shupeng Chen, Shulong Wang
Published 2016-06-01

Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition

by Xing Wang, Hongxia Liu, Lu Zhao, Chenxi Fei, Xingyao Feng, Shupeng Chen, Yongte Wang
Published 2017-03-01