Suggested Topics within your search.
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Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
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3D microstructures
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Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
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Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
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Cutting edges
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Differential scanning calorimetry
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Diffraction
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Diffraction intensity
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Diffusion
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Direct write lithography
1
Direct-write lithography
1
Electrodes
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Electromotive force
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Emulsification
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Expensive equipments
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Exposure correction
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Fabrication
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Feature sizes
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Figure of merit
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721by Furtak, Kamila“... investigated and quantified the structural changes occurred during photoresist exposure to the light. However...”
Published 2017
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722
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723“.... And then, they were dispersed into photoresist. As a representative illustration, a magnetic microturbine with high...”
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724“... package provide the new structure of the bonding. The copper is need to be like solder, and photoresist...”
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725“... layer and a nickel structural layer are used in the microfabriction process. A negative photoresist JSR...”
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726
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727“... be directly written on the photoresist by E-beam lithography system. The positive photoresist and traditional...”
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728“...) ratio was 960 Ω.μ㎡. Adjusting the etching parameters and the baking temperature of the photoresist (man...”
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729“..., and most importantly, coating with a black–photoresist. Two applications have been experimentally...”
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730by A. S. Koval“... photoresist (microscope – OLYMPUS BX-41, photoresist – OLYMPUS U-CMAD3, Japan). Active pharmaceutical...”
Published 2021-02-01
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731by Gavin Lennon, Shannon Willox, Ragini Ramdas, Scott J. Funston, Matthew Klun, Robert Pieh, Stewart Fairlie, Sara Dobbin, Diego F. Cobice“... conditions mimicking those of general photoresist removal processes can invoke the oxidation of NMP during...”
Published 2020-01-01
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732by Meenashi Sundaram, Vijay“...-patterns on a UV sensitive photoresist using nanosecond laser light with lamda~409nm. The smallest pattern...”
Published 2011
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733by Song, In-Hyouk“... process utilizes S1813 photoresist as a sacrificial layer in conjunction with a thicker resist like AZ P...”
Published 2005
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734by Rihtnesberg, David Boban“..., and then a positive photoresist layer with thickness of 1.5 μm was patterned for allowing the growth of ZnO...”
Published 2011
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735by Thi Huong Au, Duc Thien Trinh, Quang Cong Tong, Danh Bich Do, Dang Phu Nguyen, Manh-Huong Phan, Ngoc Diep Lai“... ( Fe 3 O 4 ) nanoparticles and a commercial SU-8 photoresist. The magnetic nanocomposite...”
Published 2017-05-01
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736“... uniform film of photoresist or polyimide on silicon wafers. During thisprocess, a small...”
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737“... photoresist pattern will form along the neck direction. The cracking line is very narrow and extends several...”
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738by Flagello, Donis George.“... limited to the area of micro-photolithography, where verification studies are done in photoresist. High NA...”
Published 1993
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739“..., in the topic of “Investigation and fabrication of stamp mold”, we used dry-film photoresist to rapidly define...”
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740“... of etched optical fiber sandwiched between two layers of thick photoresist SU-8 3050 and then packaged...”
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