Structural and Optical Characterizations of Ge Nanostructures Fabricated by RF Magnetron Sputtering and Rapid Thermal Processing
In this work, we use a simple and cost effective technique of sputtering followed by the rapid thermal processing at 900 degrees C for 30 s to form Ge nanostructures on the Si(100) substrate. A layer of Ge (300 nm) and Si cap layer (100 nm) were deposited using RF magnetron sputtering. Two samples w...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Series: | ACTA PHYSICA POLONICA A
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| Online Access: | View Fulltext in Publisher |