Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel
We report the use of electron beam lithography and a bilayer lifto® process to fabricate magnetic Ni nanostructures with constriction widths in the range of 22 to 41 nm. The structures fabricated correspond to the nanobridge geometry. Reproducibility and control over the final nanostructure geometry...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2010.
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| Subjects: | |
| Online Access: | Get fulltext |