The influence of BF2 and F implants on the 1/f noise in SiGe HBTs with a self-aligned link base

A study is made of 1/f noise in SiGe HBTs fabricated using selective growth of the Si collector and non-selective growth of the SiGe base and Si emitter cap. The transistors incorporate a self-aligned link base formed by BF2 implantation into the field oxide below the p+ polysilicon extrinsic base....

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Bibliographic Details
Main Authors: Lukyanchikova, N (Author), Garbar, N (Author), Petrichuk, M (Author), Schiz, J F W (Author), Ashburn, P (Author)
Format: Article
Language:English
Published: 2001-12.
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