Anomalous PBTI Effects in N-Type Super Junction under High Gate Voltage Stress

• Main Authors: Chen, L. (Author), Sun, Q. (Author), Tang, H. (Author), Xu, H. (Author), Zhu, H. (Author)
• Format: Article
• Language: English
• Published: MDPI 2022
• Subjects: carrier injection; gate stress; PBTI
• Online Access: View Fulltext in Publisher

 In this work, an anomalous thick oxide-degradation phenomenon in n-type 650-V class super-junction VDMOS transistors is investigated. An unexpected threshold voltage (Vt) decrease was observed with high positive bias temperature instability stress, and the saturation current (IDsat) increases with the stress time. Repeatable and reproducible behaviors have been achieved from multiple devices under test. Based on simulation and experimental results, it is found that the high-energy electrons (caused by high positive gate voltage) in the n-type region at the bottom of the gate oxide layer (top of the N-pillar) are injected into the gate oxide. The high-energy electrons generate electron-hole pairs during the transport to the anode, leaving holes in the gate oxide layer, and thus decreased Vt and increased IDsat. Finally, C-V measurement is also carried out which further confirms the above analysis. © 2022 by the authors. Licensee MDPI, Basel, Switzerland.