Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis

Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis

The PELIICAEN (Platform for the Study of Ion Implantation Controlled and Analyzed at the Nanometric Scale) setup is a unique device, both for all of its in situ ultra-high vacuum equipment (focused ion beam column, secondary electron microscope, atomic force microscope, and scanning tunneling micros...

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Bibliographic Details
Main Authors: Been, T. (Author), Birou, T. (Author), Bourin, C. (Author), Cassimi, A. (Author), Delobbe, A. (Author), Guillous, S. (Author), Houel, A. (Author), Keizer, A. (Author), Lalande, M. (Author), Mellier, J.-B (Author), Ramillon, J.-M (Author), Salou, P. (Author), Sineau, A. (Author)
Format: Article
Language:English
Published: American Institute of Physics Inc. 2022
Subjects:
Atomic force
Beam-columns
Cyclotrons
Electron cyclotron resonance
Focused ion beams
Focused ions beams
Image enhancement
Image resolution
Ion implantation
Ion sources
Ions implantation
Multiply charged
Nano scale
Nanometric scale
Performance
Secondary electrons
Surface-modification
Vacuum applications
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