Ice-assisted electron-beam lithography for MoS2 transistors with extremely low-energy electrons

Ice-assisted electron-beam lithography for MoS2 transistors with extremely low-energy electrons

Ice-assisted electron-beam lithography (iEBL) by patterning ice with a focused electron-beam has emerged as a green nanofabrication technique for building nanostructures on diverse substrates. However, materials like atomically thin molybdenum disulfide (MoS2), can be easily damaged by electron irra...

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Bibliographic Details
Main Authors:	Hong, Y. (Author), Qiu, M. (Author), Yao, G. (Author), Zhao, D. (Author), Zheng, R. (Author)
Format:	Article
Language:	English
Published:	Royal Society of Chemistry 2022
Online Access:	View Fulltext in Publisher

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