Ice-assisted electron-beam lithography for MoS2 transistors with extremely low-energy electrons
Ice-assisted electron-beam lithography (iEBL) by patterning ice with a focused electron-beam has emerged as a green nanofabrication technique for building nanostructures on diverse substrates. However, materials like atomically thin molybdenum disulfide (MoS2), can be easily damaged by electron irra...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Royal Society of Chemistry
2022
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| Online Access: | View Fulltext in Publisher |