Surface reflection hyperthermal neutral stream source
A novel source of hyperthermal (1-30 eV) reactive neutrals based on the surface-reflection-neutralization technique is described. This source is potentially capable of minimizing the charge-induced damage associated with plasma based semiconductor processing steps. The goal of this thesis is to inve...
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| Format: | Others |
| Language: | English |
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W&M ScholarWorks
1996
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| Online Access: | https://scholarworks.wm.edu/etd/1539623889 https://scholarworks.wm.edu/cgi/viewcontent.cgi?article=3799&context=etd |