Silicon oxynitride: A field emission suppression coating
We have studied coatings deposited using our inductively-coupled RF plasma ion implantation and desposition system to suppress field emission from large, 3-D electrode structures used in high voltage applications, like those used by Thomas Jefferson National Accelerator Facility in their DC-field ph...
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| Format: | Others |
| Language: | English |
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W&M ScholarWorks
2006
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| Online Access: | https://scholarworks.wm.edu/etd/1539623498 https://scholarworks.wm.edu/cgi/viewcontent.cgi?article=3289&context=etd |