Development of a high resolution nanolithography technique on non-planar surfaces using an evaporated electron beam resist
Electron beam lithography systems used for patterning of extremely small structures are a very important tool for nanofabrication technologies. The on going miniaturization of electronic and photonic device, leads to a constant shrinking and increasing pattern density. Fundamental physical effects s...
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| Language: | English |
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Université de Sherbrooke
2006
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| Online Access: | http://savoirs.usherbrooke.ca/handle/11143/1811 |