Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces
NiSi and Ni(Pt)Si, and of the effects of dissociated ammonia on oxide reduction was carried out under controlled ultrahigh vacuum (UHV) conditions. X-ray photoelectron spectroscopy (XPS) has been used to characterize the evolution of surface composition. Vicinal surfaces on NiSi and Ni(Pt)Si were fo...
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| Format: | Others |
| Language: | English |
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University of North Texas
2010
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| Online Access: | https://digital.library.unt.edu/ark:/67531/metadc31542/ |