Surface and Interfacial Studies of Metal-Organic Chemical Vapor Deposition of Copper
The nucleation and successful growth of copper (Cu) thin films on diffusion barrier/adhesion promoter substrates during metal-organic chemical vapor deposition (MOCVD) are strongly dependent on the initial Cu precursor-substrate chemistry and surface conditions such as organic contamination and oxid...
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| Format: | Others |
| Language: | English |
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University of North Texas
1997
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| Online Access: | https://digital.library.unt.edu/ark:/67531/metadc278058/ |