Feedback Control for Electron Beam Lithography

Feedback Control for Electron Beam Lithography

Scanning-electron-beam lithography (SEBL) is the primary technology to generate arbitrary features at the nano-scale. However, pattern placement accuracy still remains poor compared to its resolution due to the open-loop nature of SEBL systems. Vibration, stray electromagnetic fields, deflection dis...

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Bibliographic Details
Main Author: Yang, Yugu
Format: Others
Published: UKnowledge 2012
Subjects:
Electron Beam Lithography
feedback control
pattern placement error
dose variation
Controls and Control Theory
Electronic Devices and Semiconductor Manufacturing
Nanotechnology fabrication
Online Access:http://uknowledge.uky.edu/ece_etds/9
http://uknowledge.uky.edu/cgi/viewcontent.cgi?article=1008&context=ece_etds

Internet

http://uknowledge.uky.edu/ece_etds/9
http://uknowledge.uky.edu/cgi/viewcontent.cgi?article=1008&context=ece_etds

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