A Study of Plasma-Induced Surface Roughness and Ripple Formation during Silicon Etching in Inductively Coupled Chlorine Plasmas

A Study of Plasma-Induced Surface Roughness and Ripple Formation during Silicon Etching in Inductively Coupled Chlorine Plasmas

京都大学 === 0048 === 新制・課程博士 === 博士(工学) === 甲第19687号 === 工博第4142号 === 新制||工||1639(附属図書館) === 32723 === 京都大学大学院工学研究科航空宇宙工学専攻 === (主査)教授 斧 髙一, 教授 稲室 隆二, 教授 青木 一生 === 学位規則第4条第1項該当 === Doctor of Philosophy (Engineering) === Kyoto University === DFAM...

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Bibliographic Details
Main Author: Nakazaki, Nobuya
Other Authors: 斧, 髙一
Format: Doctoral Thesis
Language:English
Published: 京都大学 (Kyoto University) 2016
Subjects:
plasma etching
plasma-induced surface roughness
ripple formation
silicon etching
inductively coupled chlorine plasmas
500
Online Access:http://hdl.handle.net/2433/215513

Internet

http://hdl.handle.net/2433/215513

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