Back End of Line Nanorelays for Ultra-low Power Monolithic Integrated NEMS-CMOS Circuits
Since the introduction of Complementary-Metal-Oxide-Semiconductor (CMOS) technology, the chip industry has enjoyed many benefits of transistor feature size scaling, including higher speed and device density and improved energy efficiency. However, in the recent years, the IC designers have encounte...
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Language: | en |
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2016
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Online Access: | Lechuga Aranda, J. J. (2016). Back End of Line Nanorelays for Ultra-low Power Monolithic Integrated NEMS-CMOS Circuits. KAUST Research Repository. https://doi.org/10.25781/KAUST-678Y8 http://hdl.handle.net/10754/609468 |