Alloying phenomenon of amorphous silicon and germanium double layers on silicon wafer generated by in-situ thermal pulse =: 原位熱脈衝對硅片上非晶硅鍺雙層薄膜所產生的合金現象.

by Yeung Ching Chung. === Thesis (M.Phil.)--Chinese University of Hong Kong, 1998. === Includes bibliographical references (leaves 69-71). === Text in English; abstract also in Chinese. === by Yeung Ching Chung. === Table of contents --- p.i === Chapter Chapter 1 --- Introduction === Chapter 1.1 --...

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Bibliographic Details
Other Authors: Yeung, Ching Chung.
Format: Others
Language:English
Chinese
Published: 1998
Subjects:
Online Access:http://library.cuhk.edu.hk/record=b5889715
http://repository.lib.cuhk.edu.hk/en/item/cuhk-322296