High Aspect Ratio Lithographic Imaging at Ultra-high Numerical Apertures: Evanescent Interference Lithography with Resonant Reflector Underlayers

High Aspect Ratio Lithographic Imaging at Ultra-high Numerical Apertures: Evanescent Interference Lithography with Resonant Reflector Underlayers

A near-field technique known as evanescent interferometric lithography allows for high resolution imaging. However its primary limitation is that the image exponentially decays within the photoresist due to physical limits. This thesis aims to overcome this limitation and presents a method to consid...

Full description

Bibliographic Details
Main Author: Mehrotra, Prateek
Language:en
Published: University of Canterbury. Electrical and Computer Engineering 2012
Subjects:
Evanescent Waves
Interference Lithography
Super resolution
Gain Medium
Resonant Reflector Layers
Fresnel Reflection
Ultra high Numerical Aperture
Solid Immersion
Optical Lithography
Photolithography
Optics
Nanotechnology
Semiconductor
High Aspect Ratio structures
Blue Laser
Effective Medium Theory
Online Access:http://hdl.handle.net/10092/6935

Internet

http://hdl.handle.net/10092/6935

Similar Items