A SIMS and TEM study of buried oxide layers in silicon
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Imperial College London
1989
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ndltd-bl.uk-oai-ethos.bl.uk-7176322018-08-21T03:26:58ZA SIMS and TEM study of buried oxide layers in siliconGriffin, Christopher James1989Imperial College Londonhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.717632http://hdl.handle.net/10044/1/47457Electronic Thesis or Dissertation |
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NDLTD |
sources |
NDLTD |
author |
Griffin, Christopher James |
spellingShingle |
Griffin, Christopher James A SIMS and TEM study of buried oxide layers in silicon |
author_facet |
Griffin, Christopher James |
author_sort |
Griffin, Christopher James |
title |
A SIMS and TEM study of buried oxide layers in silicon |
title_short |
A SIMS and TEM study of buried oxide layers in silicon |
title_full |
A SIMS and TEM study of buried oxide layers in silicon |
title_fullStr |
A SIMS and TEM study of buried oxide layers in silicon |
title_full_unstemmed |
A SIMS and TEM study of buried oxide layers in silicon |
title_sort |
sims and tem study of buried oxide layers in silicon |
publisher |
Imperial College London |
publishDate |
1989 |
url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.717632 |
work_keys_str_mv |
AT griffinchristopherjames asimsandtemstudyofburiedoxidelayersinsilicon AT griffinchristopherjames simsandtemstudyofburiedoxidelayersinsilicon |
_version_ |
1718726036757151744 |