A SIMS and TEM study of buried oxide layers in silicon

Bibliographic Details
Main Author: Griffin, Christopher James
Published: Imperial College London 1989
Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.717632
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spelling ndltd-bl.uk-oai-ethos.bl.uk-7176322018-08-21T03:26:58ZA SIMS and TEM study of buried oxide layers in siliconGriffin, Christopher James1989Imperial College Londonhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.717632http://hdl.handle.net/10044/1/47457Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
author Griffin, Christopher James
spellingShingle Griffin, Christopher James
A SIMS and TEM study of buried oxide layers in silicon
author_facet Griffin, Christopher James
author_sort Griffin, Christopher James
title A SIMS and TEM study of buried oxide layers in silicon
title_short A SIMS and TEM study of buried oxide layers in silicon
title_full A SIMS and TEM study of buried oxide layers in silicon
title_fullStr A SIMS and TEM study of buried oxide layers in silicon
title_full_unstemmed A SIMS and TEM study of buried oxide layers in silicon
title_sort sims and tem study of buried oxide layers in silicon
publisher Imperial College London
publishDate 1989
url http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.717632
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