Development of single-source CVD precursors for group IV, V and VI metal disulfides
Transition metal dichalcogenides (TMDs) exhibit a wide range of interesting properties and potential applications. The major barrier to the use of these materials in devices is the formation of high quality thin films. Chemical vapour deposition (CVD) is a scalable technique which can provide high q...
| Main Author: | |
|---|---|
| Other Authors: | |
| Published: |
University of Bath
2017
|
| Subjects: | |
| Online Access: | https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.715262 |