Block copolymer patterning of functional materials
The objective of this work is to develop and apply the use of block copolymer self assembly as a precision patterning tool on the 10 nm length scale for functional materials in thin films. These methods and resulting structures are interesting for a wide range of applications in nanotechnology, howe...
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University of Cambridge
2014
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.607586 |