Application of focused ion beam for micro-machining and controlled quantum dot formation on patterned GaAs substrate
This project is a study based on the application of focused ion beam (FIB) instrumentation, which has been widely used in fields such as electronic engineering, materials science, semiconductor technology and nanotechnology. We used a Ga+ source focused ion beam column from Orsay Physics mounted on...
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University of Sheffield
2013
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.605390 |