Controlled translation and oscillation of micro-bubbles near a surface in an acoustic standing wave field
The removal of contamination particles from silicon wafers is critical in the semiconductor industry. Traditional cleaning techniques encounter difficulties in cleaning micro and nanometer-sized particles. A promising method that uses acoustically-driven micro-bubbles to clean contaminated surfaces...
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Imperial College London
2013
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.570073 |