Chemical vapour deposition of titanium and vanadium arsenide thin films
This thesis describes the chemical vapour deposition (CVD) of titanium and vanadium arsenide thin films. The compounds [TiCl4(AsPh3)], [TiCl4(AsPh3)2], [TiCl4(Ph2AsCH2AsPh2)], [TiCl4(tBuAsH2)n] have been synthesised from the reaction of TiCl4 with the corresponding arsine, and they have been investi...
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University College London (University of London)
2011
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.565306 |