Nucleation and crystallisation of hafnium compounds and thin films
Hafnia and hafnium silicate are leading high-? materials to replace SiO2 in CMOS devices. In this thesis the results of a study of bulk powders and thin films of these materials are reported. Bulk powders were investigated to provide a greater understanding of the crystallisation process by which Hf...
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Imperial College London
2008
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.503174 |