Growth and characterisation of III-V semiconductor nanostructures
This thesis describes the growth and characterisation of III-V semiconductor materials and nanostructures. The material was grown by molecular beam epitaxy (MBE) and characterised using a range of techniques including atomic force microscopy (AFM), cross-sectional scanning tunnelling microscopy (XST...
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University of Nottingham
2008
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Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.490983 |