The effects of oxide growth on the distribution of impurities in silicon

Bibliographic Details
Main Author:	Heywood, G.
Published:	Open University 1979
Subjects:	530.41
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.459033

id	ndltd-bl.uk-oai-ethos.bl.uk-459033
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-4590332017-12-24T16:55:21ZThe effects of oxide growth on the distribution of impurities in siliconHeywood, G.1979530.41Open Universityhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.459033Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.41
spellingShingle	530.41 Heywood, G. The effects of oxide growth on the distribution of impurities in silicon
author	Heywood, G.
author_facet	Heywood, G.
author_sort	Heywood, G.
title	The effects of oxide growth on the distribution of impurities in silicon
title_short	The effects of oxide growth on the distribution of impurities in silicon
title_full	The effects of oxide growth on the distribution of impurities in silicon
title_fullStr	The effects of oxide growth on the distribution of impurities in silicon
title_full_unstemmed	The effects of oxide growth on the distribution of impurities in silicon
title_sort	effects of oxide growth on the distribution of impurities in silicon
publisher	Open University
publishDate	1979
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.459033
work_keys_str_mv	AT heywoodg theeffectsofoxidegrowthonthedistributionofimpuritiesinsilicon AT heywoodg effectsofoxidegrowthonthedistributionofimpuritiesinsilicon
_version_	1718580134335741952

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