The preparation and optical properties of niobium dioxide films
Niobium dioxide films have been prepared by the radio frequency sputtering of Niobium dioxide powder targets. Polycrystalline films have been deposited onto Silicon substrates maintained at temperatures exceeding 900 K during preparation. Characterisation by X-ray diffraction and E.S.C.A. indicates...
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University of Bradford
1986
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.374936 |