Nucleation and Growth of Single Layer Graphene on Supported Cu Catalysts by Cold Wall Chemical Vapor Deposition

abstract: Chemical Vapor Deposition (CVD) is the most widely used method to grow large-scale single layer graphene. However, a systematic experimental study of the relationship between growth parameters and graphene film morphology, especially in the industrially preferred cold wall CVD, has not bee...

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Bibliographic Details
Other Authors: Das, Shantanu (Author)
Format: Doctoral Thesis
Language:English
Published: 2018
Subjects:
Online Access:http://hdl.handle.net/2286/R.I.50114

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